NuFlare Technology, Inc.

1976	December	Transfer of semiconductor manufacturing equipment business technology, centered on electronic beam mask writers, from Toshiba Corporation to Toshiba Machine Co., Ltd. (currently NuFlare Technology). An electronic beam mask writer-related technical support agreement was signed between Toshiba Corporation and Toshiba Machine Co., Ltd. (currently NuFlare Technology), and the development, manufacturing, and ordering of the EBM-105 series writers commenced, based on the collaboration of Toshiba Corporation.
1979	April	Electronic beam mask writer won the Nikkan Kogyo Shimbun newspaper’s Best 10 New Products Prize1 (1 Every year, the Nikkan Kogyo Shimbun newspaper carefully selects and recognizes ten excellent items from among products developed and commercialized by Japanese corporations.)
1984	June	Through a joint project with Toshiba Corporation’s research laboratory, completed a variable shaped beam-type electronic beam mask writer (EBM-130V), our first model.
1992	June	With Toshiba Corporation, jointly developed the HT-2000 (carbon heating-type) high-speed rotating epitaxial growth system. This was Japan’s first domestically produced sheet system.
1995	December	Received The Prize for the Promotion of the Machine Industry
1998	December	Through a joint project with Toshiba Corporation, developed and commercialized a variable shaped beam-type electronic beam mask writer (EBM-3000). Our first commercial model, this was compatible with 180-150nm design rules.
2002	June	Developed and commercialized EBM-4000 electron beam mask writer for 65-nm (circuit line) design rules. (Up to this point, Semiconductor Equipment Division of Toshiba Machine Co., Ltd.).
	August	NuFlare Technology, Inc. took over the entire semiconductor equipment business of Toshiba Machine Co., Ltd. and commenced operations.
	December	Participated in Semicon Japan 2002 for the first time as NuFlare Technology, Inc.
2003	February	Expansion of clean room as manufacturing facilities expanded.
	April	Development commissioning agreement signed with Toshiba Machine Company, America, the US subsidiary of Toshiba Machine Co., Ltd., and the USA Satellite office established.
	November	Opened the “Yokohama Satellite” office, an R&D base, in Yokohama. (In October 2004, moved Sales Division to Yokohama Satellite.)
2004	September	Developed and commercialized EBM-5000 electron beam mask writer for 65-nm circuit lines.
	November	In recognition of development of proximity effect compensation technology, awarded the Promotion Foundation for Electrical Science and Engineering Award2 (Ohm Technology Award), a special prize to commemorate the 90th anniversary of the foundation of Ohmsha, Ltd. (2 The Promotion Foundation for Electrical Science and Engineering confers this prize on an organization or individual who has achieved excellent results and is expected to achieve still more outstanding results in the future fors an invention, modification, production increase, research, or survey, etc., that has contributed to the advance of Japan’s electrical technology or the development of electrical utilities industries, telecommunications, or electronic communications culture.)
2006	March	Reception of intel's“Preferred Quality Supplier”(PQS) Award
	April	Announcment of EBM-6000
	June	Mask Inspection Business started
2007	March	Started-up Yokohama Operations
	April	Equity listend on JASDAQ Stock Exchange
	October	NuFlare Technology headquarters relocate to Shinyokohama, Kouhoku-ku Yokohama-shi Kanagawa.