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PDList of Awards Received by Nuflare Technology,Inc.Employees |
| Date Awarded |
Title of Award |
Title of Work |
Organization |
| June 19th, 2006 |
The National Commendation for Invention (2006)@The Prize of the Minister of Economy Trade and Industry |
gInvention of Proximity Effect Correction for Electron Beam Writing Systemh |
Japan Institute of Invention and Innovation (JIII) |
| April 17th, 2007 |
The Commendation for Science and Technology by the Minister of Education, Culture, Sports, Science and Technology (2007) Prize for Science and Technology (Development Category ) |
gDevelopment of Proximity Effect Correction for Electron Beam Mask Writing Systemh |
Ministry of Education, Culture, Sports, Science and Technology |
QDRefereed Papers by NuFlare Technology,Inc.Employees |
| Publication Year |
Title of Paper |
Name of Journal |
| 2007 |
High-Accuracy Proximity Effect Correction for Mask Writing |
Japanese Journal of Applied Physics,Vol.46A, p826 |
| 2007 |
Global Critical Dimension Correction I.
Fogging Effect Correction |
Japanese Journal of Applied Physics,Vol.46A, p3359 |
| 2007 |
Global Critical Dimension Correction II |
Japanese Journal of Applied Physics,Vol.46A, p3368 |
| 2008 |
Accurate correction of critical dimension errors appearing in LSI fabrication processes |
Journal of Micro/Nano Lithography, MEMS,and MOEMS Vol.7, 023006 |
| 2008 |
High accuracy correction of critical dimension errors taking sequence of large-scale integrated circuits fabrication processes into account |
Journal of Micro/Nano Lithography, MEMS, and MOEMS Vol.7, 043008 |
| Date |
Title |
Type |
| 2000N |
Sub-Half-Micron Lithography for ULSIs
(Cambridge University Press)
Section 4.4 Proximity effect correction |
Book |
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