One of our main products, the EBM-6000 PLUS, is suitable for hp45nm production
and hp32nm development.
According to the 2007 edition of ITRS (International Technology Roadmap for Semiconductors), the production of hp32nm devices is expected to start between 2011 and 2013.
Because development of photomasks should precede this, lithography tools
must be developed even earlier.
We will continue to develop mask lithography tools for hp22nm and beyond, while keeping a close watch on the trend of future lithography technologies, such as EUV lithography and nanoimprint technology.
@yDevelopment Roadmapz
Our main product, the EBM-6000 PLUS electron beam mask writer, is used
for creating photomasks for 45-nm minimum design rule patterns.
The following depiction postulates a distance of 100 kilometers from Tokyo Tower to Mt. Fuji.
From Tokyo Tower, the EBM-6000 PLUS could hit a target on the top of Mt.Fuji
of this sizeirelative sizej
