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| Electron beam mask writers are systems based on
technologies from a number of diverse areas, including physics, chemistry, electrical
engineering, mechanical engineering, control engineering, information processing
engineering, and telemetry. Electron beam mask writers are a composite of technologies
where various leading-edge specialties merge. These range from minute geometry,
typified by nanotechnology (at the scale of one billion to one), to technology
for processing enormous amounts of data on the gterah (one trillion) scale. Driven
by a commitment to challenge new frontiers and inspired by the slogan gendlessly
challenging,h we are working to realize our aspirations and contribute to the
emergence of the gubiquitous society.h |
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Nano-order speed and high-precision control technologies
On the same principle of a TV cathode ray tube, electron beam mask writers emit streams of electrons from an electron gun, using the electron streams to form a circuit pattern on photomask. Electron beam mask writers both precisely control the position of the electron stream and scan at high speed. The positional accuracy on the photomask needs to be on a nano-order scale. If we compare the scanning speed and positional accuracy of an electron beam mask writer to a satellite orbiting the Earth at an altitude of around 220 kilometers, the writerfs scan speed and accuracy would be equivalent to the satellite crossing the Australian continent in one second and shooting a coin on the continentfs surface. Without high-speed, high-precision circuit and power control technologies, high-quality semiconductor circuit patterns could not be formed with a high throughput. |
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 Nano-order ultra-precision machine technology
Electron beam mask writers fix the photomask on a platform that moves on X and Y axes, and write the circuit pattern while continually moving the platform. The platform is feedback-controlled using positional information from a precision sensor known as a laser interferometer. Moving the platform causes an almost unnoticeably slight mechanical vibration. Like noise in an electrical system, the mechanical vibration cannot be completely eliminated. So that it doesnft affect the writing patternfs positional accuracy, it is necessary to control that vibration and keep it within an acceptable range. To this end, we have developed and succeeded in applying the highest level ultra-precision platform and optimal mechanical control technology. The key to controlling mechanical vibration is making mechanical parts highly rigid, using the correct amount of damping, and applying integrated control technology. Finally, we are optimizing our mechanical systems and mechanical control systems to minimize the vibration to the level of several times the space between the atoms of single-crystal silicone. |
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 Tera-order speed and high-capacity information processing technology
With the miniaturization of semiconductors, processor and memory performance has improved dramatically and computer processing power has increased exponentially. As semiconductor integration precision improves, the circuit pattern writing data handled by electron beam mask writers is becoming enormous. Another factor in the burgeoning amount of data being processed is compensatory information to prevent mutual interference among the labyrinths of patterns. When generating writing data from LSI circuit pattern data, the volume of information can reach the terabyte level (tera = 1,000,000,000,000). NuFlare Technology uses cutting-edge processors to parallel process large volumes of terabyte-class data, and we are developing and implementing high-speed computing technologies. The speed of our calculation processing technology has reached speeds equivalent to watching a movie in 4.7 seconds. In the future, data volumes are expected to increase explosively, and we are continuing to develop toward still higher processing speeds.
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