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EB Mask Writer EBM-8000
EB Mask writer for hp 22nm Production |
| The EB Mask Writer system hEBM-8000 h with enhanced placement accuracy is suitable for developing next generation photo-masks. |
Features |
1) 50kV acceleration voltage enables greater contrast writing.
2) Multiple pass writing method improves the performance of shot stitching.
3) High throughput with variable stage speed and high current@Density(400A/cm2)
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Key Parameters |
| Mask size |
6inch |
| Acceleration voltage |
50kV |
| Current density |
400A/cm2 |
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