Product Information
Product Lineup
EB Mask writer
Mask Inspection Systems
Epitaxial Reactor
HT Series
EGV Series
Mask Inspection System NPI-6000

High Productivity Mask Inspection System

The most advanced high throughput Mask Inspection System hNPI-6000 h for hp32nm design rule.

Features

1) 199nm wavelength light source.
2) High speed concurrent Reflection/Transmission inspection within 120 minutes.
3) High sensitivity to enables inspection of the most advanced photomasks.

Key Parameters

Mask size 6inch
Wavelength 199nm
Inspection time 120minutes