Photomasks are quartz plates which play the core role in lithography processes, used as original master patterns of semiconductor devices for printing circuit patterns on silicon wafers. The EB Mask Writer is used for creating photomasks with minute geometry patterns.
Rapid progress has been made in semiconductor device technology, realized by remarkable advances in the downscaling of circuit geometries. The Mask Inspection System is used for detecting defects in patterns written on photomasks to be transferred to wafers.
Single wafer epitaxial reactor with high growth rate produces high quality epi film with superior t/ρ uniformity highly efficiently consuming minimal power.