Mask Inspection System
High Productivity Mask Inspection System
Mask Inspection System
NPI-8000
The Mask Inspection System NPI-8000 and NPI-8000V are used for detecting defects in patterns written on photomasks to be transferred to wafers.
Features
- 1) 199nm wavelength light source.
- 2) High speed inspection within 60 minutes.
- 3) High sensitivity to enables inspection of the most advanced photomasks.
Key Parameters
| Mask size | 6inch |
|---|---|
| Wavelength | 199nm |
| Inspection time | 60minutes |
Development Roadmap
The Mask Inspection Systems are utilized to detect defects in photomask patterns stepped by electron beam mask writers. NuFlare Technology will continue to develop leading edge mask writers while watching the trend of next generation lithography technology, such as EUV or nanoimprint, to meet the needs of developing devices for the 5nm generation and after.
