Research and Development
To achieve the high performance, advanced functionality and low power dissipation demanded by today's LSI chips, geometry scaling is essential.
However, reduced geometry makes the manufacturing process more difficult and impacts manufacturing yields because scaling triggers new flaw mechanisms and brings out numerous error factors.
For this reason, the semiconductor industry is advocating the importance of optimizing the entire fabrication process, encompassing chip design to manufacturing.
Design-for-manufacturing (DFM) is the engineering art of optimizing design to facilitate the manufacture process.
Based on the DFM principle, the entire industry including semiconductor, materials and device manufacturers are now collaborating to develop breakthrough technologies and solutions.
The electron beam mask lithography system is positioned upstream in the semi- ther control the variations of circuit patterns printed onto photomasks, and conducting R&D to advance device scaling.
There are many semiconductor related manufacturers throughout the world, each of which has a different role to fulfill.
Amongst diverse roles, our focus is on electron beam mask lithography.
We are aiming to become a one-of-the-kind company specialized in semiconductor manufacturing equipment where people seeking the best want to work.
Through close collaboration with leading-edge semiconductor manufacturers, we are exploring next-generation technologies to become the world's most premier presence in the industry.
Our multidisciplinary professionals involved in DFM offer innovative semiconductor solutions.