Transfer of semiconductor manufacturing equipment business technology, centered on electronic beam mask writers, from Toshiba Corporation to Toshiba Machine Co., Ltd. (currently NuFlare Technology).
An electronic beam mask writer-related technical support agreement was signed between Toshiba Corporation and Toshiba Machine Co., Ltd. (currently NuFlare Technology), and the development, manufacturing, and ordering of the EBM-105 series writers commenced, based on the collaboration of Toshiba Corporation.
Electronic beam mask writer won the Nikkan Kogyo Shimbun newspaper's Best 10 New Products Prize*1
(*1 Every year, the Nikkan Kogyo Shimbun newspaper carefully selects and recognizes ten excellent items from among products developed and commercialized by Japanese corporations.)
Through a joint project with Toshiba Corporation's research laboratory, completed a variable shaped beam-type electronic beam mask writer (EBM-130V), our first model.
With Toshiba Corporation, jointly developed the HT-2000 (carbon heating-type) high-speed rotating epitaxial growth system. This was Japan's first domestically produced sheet system.
Developed and commercialized HT2000B Epitaxial Reactor.
Received The Prize for the Promotion of the Machine Industry
Through a joint project with Toshiba Corporation, developed and commercialized a variable shaped beam-type electronic beam mask writer (EBM-3000). Our first commercial model, this was compatible with 180-150nm design rules.
Developed and commercialized EBM-4000 EB Mask Writer for 90-nm (circuit line) design rules. (Up to this point, Semiconductor Equipment Division of Toshiba Machine Co., Ltd.).
Developed and commercialized HT3000 12 Single Wafer Si Epitaxial Reactor.
NuFlare Technology, Inc. took over the entire semiconductor equipment business of Toshiba Machine Co., Ltd. and commenced operations.
Participated in Semicon Japan 2002 for the first time as NuFlare Technology, Inc.
Expansion of clean room as manufacturing facilities expanded.
Development commissioning agreement signed with Toshiba Machine Company, America, the US subsidiary of Toshiba Machine Co., Ltd., and the USA Satellite office established.
Opened the "Yokohama Satellite" office, an R&D base, in Yokohama. (In October 2004, moved Sales Division to Yokohama Satellite.)
Developed and commercialized EBM-5000 electron beam mask writer for 65-nm circuit lines.
In recognition of development of proximity effect compensation technology, awarded the Promotion Foundation for Electrical Science and Engineering Award*2 (Ohm Technology Award), a special prize to commemorate the 90th anniversary of the foundation of Ohmsha, Ltd. (*2 The Promotion Foundation for Electrical Science and Engineering confers this prize on an organization or individual who has achieved excellent results and is expected to achieve still more outstanding results in the future fors an invention, modification, production increase, research, or survey, etc., that has contributed to the advance of Japan's electrical technology or the development of electrical utilities industries, telecommunications, or electronic communications culture.)
Reception of Intel's "Preferred Quality Supplier"(PQS) Award
Announcment of EBM-6000
Mask Inspection Business started
Started-up Yokohama Operations
Equity listed on JASDAQ Securities Exchange
NuFlare Technology headquarters relocate to Shinyokohama, Kouhoku-ku Yokohama-shi Kanagawa.
Developed and commercialized EBM-6000PLUS (for double patterning research and development).
Developed and commercialized EBM-7000 (for half-pitch (hp) 32 nm node generation).
Established NFT KOREA,Inc. in Suwon,Korea
Equity listed on Osaka Securities Exchange JASDAQ Standard due to Osaka Securities Exchange merged with Jasdaq Securities Exchange, Inc.
Developed and commercialized EBM-8000 (for 14 nm technology node, half-pitch (hp) 22 nm node generation).
NuFlare Awarded The 59th Okochi Memorial Grand Production Prize
Developed and commercialized EBM-9000 (for 10 nm technology node).
Opened NFT Germany Branch Office in Dresden, Germany.
Equity listed on Tokyo Stock Exchange JASDAQ Standard due to Tokyo Stock Exchange merged with Osaka Securities Exchange.
NuFlare Technology headquarters relocate to Shinsugita, isogo-ku Yokohama-shi Kanagawa.
Released EPIREVOTM G8 GaN-on-Si MOCVD for LED on 8 silicone substrates.
Established NuFlare Technology America, Inc.
Developed and commercialized EPIREVOTM S6 SiC Epitaxial Reactor.
Won the Incentive Award for Safety Award by Minister of Health, Labour and Welfare
Developed and commercialized EBM-9500 (for 7 nm technology node).
Developed and commercialized EBM-9500PLUS (for 5nm/7nm+ nm technology node).
Developed and commercialized EBM-8000P (for 14/16 nm technology node, 20～45 nm technology node ).
Established NFT Taiwan, Inc. (the company’s Taiwan subsidiary) NFT Taiwan, Inc.
Delisted from Tokyo Stock Exchange as of March 30,2020
Toshiba Electronic Devices & Storage Corporation acquired 100% shares of NuFlare Technology, Inc. as a subsidiary company.
Selected as one of the “Global Niche Top 100 Companies” by the Ministry of Economy, Trade and Industry.
Developed and commercialized EPIREVOTM S8 SiC Epitaxial Reactor.
Developed and commercialized MBM™-2000 (for 3nm technology node generation).