EB Mask Writer EBM-9500
for 7nm+/5nm node Production
EB Mask Writer
EBM-9500PLUS
Variable EB Mask Writer system "EBM-9500PLUS" for 7nm+/5nm node.
Features
- 1) 50kV acceleration voltage enables writing in greater contrast.
- 2) Multiple pass writing method improves the performance of shot stitching.
- 3) Low COO（Cost of Ownership）
Key Parameters
| Mask size | 6inch |
|---|---|
| Image placement | 1.8nm（3σ） |
| Local CD uniformity | 1.3nm（3σ） |
